The SPIE Advanced Lithography + Patterning event is a premier conference for the semiconductor industry, held annually in San Jose, California, US. The event is scheduled to take place from 22-26 February 2026, and its 50th anniversary edition was celebrated in 2026. The symposium brings together leading researchers and experts in the field of optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. The conference provides a platform for attendees to share research, challenges, and breakthroughs, and to learn from one another. The event features a comprehensive program, including plenary talks, technical presentations, networking sessions, and course offerings. The technical program includes sessions on optical and EUV nanolithography, DTCO and computational patterning, metrology, inspection, and process control, as well as novel patterning technologies, advances in patterning materials and processes, and advanced etch technology and process integration for nanopatterning. In addition to the conference program, the event features an exhibition where attendees can connect with technology solution providers, including photoresist, EUV, and other specialty materials, e-beam lithography systems, precision cleaning, contamination, transport support materials, and wafer treatments and substrates. Students are also encouraged to participate in the event, with opportunities to attend for free through grants, awards, and scholarships. The conference app is available for download, providing attendees with access to the most current program content and the ability to build a personalized schedule and connect with other attendees.